Jiaxian Corporation: The second phase of the photoresist project is expected to be completed by the end of this year, mainly used downstream for the synthesis of photoresist.

Jiaxian Co. recently stated in an investor relations event that the company's second phase photolithography resist project has already begun construction. It is expected to be completed by the end of this year, with the specific progress subject to the actual construction of the project. The second phase project consists of two other monomers, mainly used for the synthesis of photolithography resist, ultimately applied in chip manufacturing and integrated circuit fields.