Qingyi Photomask (688138.SH): 55nm PSM products have been delivered and entered the customer online certification stage.

Zhitong Finance APP News, Qingyi Photomask (688138.SH) disclosed the R&D progress of high-end semiconductor photomasks. As of the date of this announcement, the company's 55nm PSM (Phase Shift Mask) product has signed a confidentiality agreement with a customer and confirmed the product specification sheet, received a customer purchase order (PO), and the product has now been delivered and entered the customer's online certification stage. PSM phase shift masks are mainly used in key lithography layers with high pattern precision requirements in semiconductor chip manufacturing, covering high-precision patterning scenarios such as logic, memory, some specialty processes, and power devices. They can improve lithography resolution, enhance pattern contrast, and broaden the lithography process window, making them an important product for the company's semiconductor photomask business to break through to higher process nodes.